Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium P. ŜpatenkaM. PetigH. Suhr OriginalPaper 01 September 1995 Pages: 371 - 381
Effect of Power Modulation on Radical Concentration and Uniformity in a Single-Wafer Plasma Reactor Ping JiangDemetre J. EconomouChee Burm Shin OriginalPaper 01 September 1995 Pages: 383 - 408
Electron Behavior in the Downstream of an Electron Cyclotron Resonance Plasma Used for Chemical Vapor Deposition M. ZhangS. NonoyamaY. Nakayama OriginalPaper 01 September 1995 Pages: 409 - 426
On the Use of the Numerical Simulation of the First Positive System of N2: I. Emission and LIF Analysis M. SimekG. DilecceS. De Benedictis OriginalPaper 01 September 1995 Pages: 427 - 449
On the Use of the Numerical Simulation of the First Positive System of N2: II. Fast Trot Estimation from the Partially Resolved (3, 0) Band M. SimekS. De Benedictis OriginalPaper 01 September 1995 Pages: 451 - 463
Destruction of Organic Compounds in a High-Frequency Discharge Plasma at Reduced Pressure J. TeplýM. DresslerC. Tesa>r OriginalPaper 01 September 1995 Pages: 465 - 479
Electron-Beam Diagnostics of Gas Mixtures Involved in SiO2 Film Deposition A. E. BelikovO. V. KuznetsovR. G. Sharafutdinov OriginalPaper 01 September 1995 Pages: 481 - 499
Nonequilibrium Vibrational Kinetics during Hypersonic Flow of a Solid Body in Nitrogen and Its Influence on the Surface Heat Flux I. ArmeniseM. CapitelliV. Smetanin OriginalPaper 01 September 1995 Pages: 501 - 528
Catalytic Halocarbon Decomposition in a Microwave Post-discharge N. L. AleksandrovS. V. DobkinA. M. Konchakov OriginalPaper 01 September 1995 Pages: 529 - 543
Formation of Titanium Carbide from Ilmenite Concentrates in a Thermal Plasma Reactor Patrick R. TaylorMilton ManriqueMasud Abdel-Latif OriginalPaper 01 September 1995 Pages: 545 - 557
Thermodynamic and Transport Properties of Argon/Helium Plasmas at Atmospheric Pressure W. L. T. ChenJ. HeberleinP. Fauchais OriginalPaper 01 September 1995 Pages: 559 - 579