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Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium

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Abstract

A Langomir probe investigation of Ar/H2/Cp2HfMe2 plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydrogen and precursor concentrations. Addition of the precursor into the discharge resulted in an appreciable decrease in the electron density and an increase in the mean electron energr. Whereas a transition front the a-mode to the γ-mode has been observed with power rise in the Ar/H2 plasmas without precursor, in the presence of the precursor the plasota α-mode remained unchanged in the power range investigated.

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Authors and Affiliations

  1. The University of South Bohemia, Faculty of Biological Sciences, Braniŝovská 31, 37005, Ĉeské Budéjovice, Czech Republic

    P. Ŝpatenka

  2. Ruhr-Universität Bochum, Experimentalphysik insbesondere Gaselektronik, Universitätsstr. 151, 44780, Bochum, Germany

    M. Petig & K. Wiesemann

  3. Universität Tübingen, Institut für organische Chemie, Auf der Morgenstelle 18, 72076, Tübingen, Germany

    H. Suhr

Authors
  1. P. Ŝpatenka
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  2. M. Petig
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  3. K. Wiesemann
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  4. H. Suhr
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Ŝpatenka, P., Petig, M., Wiesemann, K. et al. Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium. Plasma Chem Plasma Process 15, 371–381 (1995). https://doi.org/10.1007/BF01650735

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  • DOI: https://doi.org/10.1007/BF01650735

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