Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.
Characterization of High Voltage Cold Atmospheric Plasma Generation in Sealed Packages as a Function of Container Material and Fill Gas
Destruction Kinetics of 2,4 Dichlorophenol Aqueous Solutions in an Atmospheric Pressure Dielectric Barrier Discharge in Oxygen
Plasma-Chemical Conversion of Hydrogen Sulfide in the Atmosphere of Methane with Addition of CO2 and O2
- Journal Title
- Plasma Chemistry and Plasma Processing
- Volume 1 / 1981 - Volume 38 / 2018
- Print ISSN
- Online ISSN
- Springer US
- Additional Links
- Industry Sectors
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