Multiscale Modeling in Epitaxial Growth

Mini-Workshop at Mathematisches Forschungsinstitut Oberwolfach January 18–24, 2004

  • Axel Voigt

Part of the ISNM International Series of Numerical Mathematics book series (ISNM, volume 149)

Table of contents

  1. Front Matter
    Pages i-viii
  2. Atomistic Models

  3. Step Flow Models

  4. Continuum Models

    1. Martin Rost
      Pages 195-208
    2. Ulrich Clarenz, Frank Haußer, Martin Rumpf, Axel Voigt, Ulrich Weikard
      Pages 227-237

About these proceedings

Introduction

Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.

Keywords

Finite differential equation epitaxial growth equation finite element method multiscale analysis numerical analysis numerical methods

Editors and affiliations

  • Axel Voigt
    • 1
  1. 1.Crystal Growth groupresearch center caesarBonnGermany

Bibliographic information

  • DOI https://doi.org/10.1007/b137679
  • Copyright Information Birkhäuser Verlag 2005
  • Publisher Name Birkhäuser Basel
  • eBook Packages Mathematics and Statistics
  • Print ISBN 978-3-7643-7208-8
  • Online ISBN 978-3-7643-7343-6
  • About this book