1. Controlling the Si(001) Surface Morphology upon Thermal Annealing in a Vacuum Chamber

   • E. E. Rodyakina
   • S. V. Sitnikov
   • A. V. Latyshev

   OriginalPaper 13 March 2019 Pages: 365 - 370

   

2. Parameters of Plasma and Kinetics of Active Particles in CF₄ (CHF₃) + Ar Mixtures of a Variable Initial Composition

   • A. M. Efremov
   • D. B. Murin
   • K.-H. Kwon

   OriginalPaper 13 March 2019 Pages: 371 - 380

   

3. Quality Control of a Multilayer Spin-Tunnel Structure with the Use of a Combination of Analytical Methods

   • O. S. Trushin
   • S. G. Simakin
   • E. A. Smirnov

   OriginalPaper 13 March 2019 Pages: 381 - 387

   

4. Investigation of Alloyed Ohmic Contacts in Epitaxial Tellurium-Doped Gallium Arsenide Layers

   • V. I. Egorkin
   • V. E. Zemlyakov
   • S. A. Mintairov

   OriginalPaper 13 March 2019 Pages: 388 - 392

   

5. Operational Features of MEMS with an Even Number of Electrodes

   • V. P. Dragunov
   • D. I. Ostertak

   OriginalPaper 13 March 2019 Pages: 393 - 406

   

6. Simulation the Effects of Single Nuclear Particles on STG RS Triggers with Transistors Spacing into Two Groups

   • V. Ya. Stenin
   • Yu. V. Katunin

   OriginalPaper 13 March 2019 Pages: 407 - 414

   

7. Modeling the Dynamics of the Integral Dielectric Permittivity of a Porous Low-K Organosilicate Film during the Dry Etching of a Photoresist in O₂ Plasma

   • A. A. Rezvanov
   • I. V. Matyushkin
   • E. S. Gornev

   OriginalPaper 13 March 2019 Pages: 415 - 426

   

8. Etching of SiC in Low Power Inductively-Coupled Plasma

   • A. A. Osipov
   • S. E. Aleksandrov
   • A. A. Osipov

   OriginalPaper 13 March 2019 Pages: 427 - 433

   

9. Etching of GaAs in the Plasma of a Freon R-12–Argon (CCl₂F₂/Ar) Mixture

   • D. B. Murin
   • A. V. Dunaev

   OriginalPaper 13 March 2019 Pages: 434 - 442

   

10. Stacked Gate FinFET with Gate Extension for Improved Gate Control

    • Sangeeta Mangesh
    • Pradeep Chopra
    • Krishan Saini

    OriginalPaper 13 March 2019 Pages: 443 - 448