A statistical analysis of polysilicon etching in a chlorine-argon plasma L. A. TullyJ. L. ShohetR. Kopitzke OriginalPaper Pages: 349 - 382
Reactive sputter etching of magnetic materials in an HCl plasma M. G. J. Heijman OriginalPaper Pages: 383 - 397
On the modulation of electron energy distribution function in radiofrequency SiH4, SiH4−H2 bulk plasmas M. CapitelliC. GorseJ. Wilhelm OriginalPaper Pages: 399 - 424
Langmuir probe measurements of axial variation of plasma parameters in 27.1 MHz rf oxygen planar discharges H. SabadilS. KlaggeM. Kammeyer OriginalPaper Pages: 425 - 444
Recent progress in the restoration of archeological metallic artifacts by means of low-pressure plasma treatment S. VepřekCh. EckmannJ. Th. Elmer OriginalPaper Pages: 445 - 466