Abstract
Boron carbonitride films are synthesized by chemical vapor deposition from a mixture of triethylamine borane and ammonia on a metallic or oxidized cobalt sublayer sprayed over Si(100) substrates. Scanning electron microscopy shows that the surface of a BC x N y /Co/Si sample has a homogeneous fine-grained structure; filamentous entities are found on the surface of the BC x N y /CoO x /Si sample. The electronic structure of the films is investigated by X-ray photoelectron spectroscopy (XPS) and near-edge X-ray absorption fine structure spectroscopy (NEXAFS). An analysis of the spectra shows that BC x N y films are composed of graphite and hexagonal boron nitride (h-BN) regions and complex BC x N y O z components with B-C, N-C, B-O, N-O, and C-O bonds. The deposition of the BC x N y film on the oxidized Co sublayer results in an increase in the number of C-O, N-O, B-O, and C-N bonds and a decrease of the graphite and h-BN components and in the number of C-B bonds. The XPS data are used to estimate the surface elemental composition of the BC x N y /CoO x /Si sample. It is found that the film consists of 66 at.% graphite component and 3 at.% h-BN; the proportion of complex C0.46B0.11N0.05O0.38 components is 31 at.%.
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Original Russian Text Copyright © 2012 by Yu. V. Fedoseeva, M. L. Kosinova, S. A. Prokhorova, I. S. Merenkov, L. G. Bulusheva, A. V. Okotrub, F. A. Kuznetsov
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Translated from Zhurnal Strukturnoi Khimii, Vol. 53, No. 4, pp. 701–709, July–August, 2012.
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Fedoseeva, Y.V., Kosinova, M.L., Prokhorova, S.A. et al. X-ray spectroscopic study of the electronic structure of boron carbonitride films obtained by chemical vapor deposition on Co/Si and CoO x /Si substrates. J Struct Chem 53, 690–698 (2012). https://doi.org/10.1134/S0022476612040117
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DOI: https://doi.org/10.1134/S0022476612040117