Abstract
We report a comprehensive study of the effect of the chemical structure of boron carbonitride films on the variability of their functional characteristics. The BCxNy films are prepared on Si(100) and fused silica substrates by reactive magnetron sputtering of a B4C target in an argon/nitrogen mixture. The deposition rate, elemental composition, and types of chemical bonds in the films is studied depending on the nitrogen content in the gas mixture. Optical (refractive index, transmission coefficient, band gap) and mechanical (hardness, Young′s modulus, substrate adhesion) characteristics are investigated depending on the deposition parameters and the chemical structure of the films. Particular attention is paid to the surface properties of the BCxNy films (morphology, roughness, contact angle, and surface free energy). Stability of the BCxNy films upon storage in air is studied for the first time. The data obtained for the composition, structural characteristics, and some functional properties of the BCxNy films are compared with those reported in literature.
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The reported study was funded by RFBR-BRICS (Grant No. 18-53-80016).
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Russian Text © The Author(s), 2021, published in Zhurnal Strukturnoi Khimii, 2021, Vol. 62, No. 8, pp. 1396-1412.https://doi.org/10.26902/JSC_id78472
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Sulyaeva, V.S., Gatapova, E.Y., Kozhevnikov, A.K. et al. CHEMICAL STRUCTURE AND FUNCTIONAL PROPERTIES OF AMORPHOUS BORON CARBONITRIDE FILMS. J Struct Chem 62, 1309–1324 (2021). https://doi.org/10.1134/S0022476621080187
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DOI: https://doi.org/10.1134/S0022476621080187