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Fabrication and Tailored Optical Characteristics of CeO2/SiO2 Nanostructures Doped PMMA for Electronics and Optics Fields

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Abstract

In this work, fabrication of poly-methyl methacrylate(PMMA)/cerium dioxide/silicon dioxide nanostructures has been investigated as promising materials to use in various electronics and optics nanodevices like photovoltaic cell, sensors, electronic gates, and transistors. The optical properties of PMMA/ CeO2/SiO2 nanostructures were studied at photon wavelength from 240 to 840 nm. The results indicated that the optical absorption of PMMA at wavelength (λ) = 240 nm was increased about 33.5% and transmission reduced about 53.7% when the CeO2/SiO2 NPs contents reached (5.4 wt.%), this behavior make it suitable for many optical approaches. The energy gap of PMMA was decreased from 4.14 eV for pure PMMA to 2.08 eV when the CeO2/SiO2 NPs content reached (5.4 wt.%), this result made it may be considered as key for various optical fields and optoelectronics nanodevices. The optical parameters values like refractive index, optical conductivity and dielectric constants of PMMA were enhanced with rise in the CeO2/SiO2 NPs content. The final obtained results showed the PMMA/ CeO2/SiO2 nanostructures have excellent optical characteristics to utilize in the optics and electronics fields.

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  1. Department of Physics, College of Education for Pure Sciences, University of Babylon, Babylon, Iraq

    Ola Basim Fadil & Ahmed Hashim

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Fadil, O.B., Hashim, A. Fabrication and Tailored Optical Characteristics of CeO2/SiO2 Nanostructures Doped PMMA for Electronics and Optics Fields. Silicon 14, 9845–9852 (2022). https://doi.org/10.1007/s12633-022-01728-1

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