Abstract
In this paper, a bias-insensitive ultra-wideband (UWB) metamaterial absorber (MMA) is designed and prepared based on photolithography. The surface structure consists of two similar copper fractal structures with patch resistors, where the external and internal structures operate at lower and higher frequencies, respectively, to extend the absorption performance through a coupling mechanism. The cell size of the MMA is 19 × 19 × 5.136 mm3 (0.22 λ0 × 0.22 λ0 × 0.06 λ0), where λ0 is the wavelength corresponding to the lowest resonant frequency. An operating bandwidth of 122.2% is achieved in the 3.50–14.49 GHz range, and an average absorption rate of greater than 95% is realized with excellent electromagnetic characteristics. Meanwhile, a polyimide film with stable performance is selected as the graphic structure substrate, and lightweight foam board and copper are used as the intermediate dielectric layer and the bottom reflective layer. The proposed metamaterial absorber is insensitive to polarization, lightweight, and flexible, and has potential applications in the S, C, and X-band ranges for reducing electromagnetic wave pollution and interference.
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Data availability
The data supporting this study’s findings are available from the corresponding author, Dr. Zeng Qu and Prof. Binzhen Zhang, upon reasonable request.
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Acknowledgements
We want to thank Dr. Qiuping Zhang for her suggestions and revisions to this article.
Funding
This work was supported by the National Natural Science Foundation of China (No. 52175555), the fund for Shanxi “1331 Project” Key Subject Construction, the National Natural Science Foundation of China (innovation community) (No. 51821003), the Fundamental Research Program of Shanxi Province (No. 20210302123074), and the Fundamental Research Program of Shanxi Province (Young Project No. 202203021212146).
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Zeng Qu, Hao Deng, and Qiuoing Zhang prepared the main manuscript; Huihui Jing processed the data in Figs. 1, 2, and 3; Yiqing Wei and Jinfeng Kang processed the data in Figs. 4, 5, and 6; Xinlei Wu and Baoli Mi processed the data in Figs. 7 and 8; Ruirui Li and Jiayun Wang carried out the process preparation; Junping Duan and Binzhen Zhang did the chip process and proofreading, and all authors reviewed the manuscript.
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Qu, Z., Jing, H., Deng, H. et al. Ultra-wideband electromagnetic interference suppression lightweight metamaterial absorber based on S/C/X frequency band. Adv Compos Hybrid Mater 6, 156 (2023). https://doi.org/10.1007/s42114-023-00734-0
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DOI: https://doi.org/10.1007/s42114-023-00734-0