1. Atomic Layer Deposition of Y₂O₃ Using Tris(butylcyclopentadienyl)yttrium and Water

   • A. I. Abdulagatov
   • R. R. Amashaev
   • I. M. Abdulagatov

   OriginalPaper 22 April 2019 Pages: 1 - 12

   

2. Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching

   • S. V. Derevyashkin
   • E. A. Soboleva
   • V. P. Korolkov

   OriginalPaper 22 April 2019 Pages: 13 - 27

   

3. The Effect of Defects with Deep Levels on the C–V Characteristics of High-Power AlGaN/GaN/SiC HEMTs

   • K. L. Enisherlova
   • Yu. V. Kolkovskii
   • S. A. Kapilin

   OriginalPaper 22 April 2019 Pages: 28 - 36

   

4. Identification and Excitation Mechanisms of the Lines and Bands of Boron-Containing Components in the Optical Emission Spectra of Low-Temperature BF₃/Ar Plasmas

   • V. P. Kudrya

   OriginalPaper 22 April 2019 Pages: 37 - 42

   

5. Magnetooptical Response of Metallized Nanostructural Arrays with a Complex Relief on the Surface of Silicon Wafers

   • V. A. Paporkov
   • A. V. Prokaznikov

   OriginalPaper 22 April 2019 Pages: 43 - 58