1. Plasma-assisted etching

   • J. W. Coburn

   OriginalPaper Pages: 1 - 41

2. Reaction of hydrogen with aromatic compounds in a 13.6-MHz discharge

   • Paul W. Schmalzl
   • Roger A. Upham
   • Larry L. Miller

   OriginalPaper Pages: 43 - 59

3. Ion and radical reactions in the silane glow discharge deposition of a-Si:H films

   • G. Turban
   • Y. Catherine
   • B. Grolleau

   OriginalPaper Pages: 61 - 80

4. Neutral and ion chemistry in a C₂H₄-SiH₄ discharge

   • Y. Catherine
   • G. Turban
   • B. Grolleau

   OriginalPaper Pages: 81 - 93

5. Kinetic study of the heterogeneous Si/H system under low-pressure plasma conditions by means of mass spectrometry

   • J. J. Wagner
   • S. Vepřek

   OriginalPaper Pages: 95 - 107

6. Summary of meetings

   • M. Boulos
   • P. Fauchais

   Abstract Pages: 109 - 109

7. Announcements

   Announcement Pages: 111 - 111