Hybrid electron cyclotron resonance-radio-frequency plasma etching of III–V semiconductors in Cl2-based discharges. Part I: GaAs and related compounds S. J. PeartonU. K. ChakrabartiM. Geva OriginalPaper Pages: 405 - 422
Hybrid electron cyclotron resonance-radio-frequency plasma etching of III–V semiconductors in Cl2-based discharges. Part II: InP and related compounds S. J. PeartonW. S. HobsonA. P. Perley OriginalPaper Pages: 423 - 438
A thermodynamic model of deposition by etching-enhanced reactive sputtering V. A. KossJ. L. Vossen OriginalPaper Pages: 439 - 453
A spectroscopic investigation of growth regimes in silane-ammonia discharges used for plasma nitride deposition S. E. HicksR. A. G. Gibson OriginalPaper Pages: 455 - 472
Quadrupole mass spectrometric study of positive ions from RF plasmas of pure CH4, CH4/H2, and CH4/Ar systems Wei ZhangYves Catherine OriginalPaper Pages: 473 - 488
Plasma-chemical decomposition of methane during diamond synthesis Larisa OkekeHerbert Störi OriginalPaper Pages: 489 - 499
Hysteresis effects in the plasma-electrode boundary sheath for frequencies of the order of the ion plasma frequency R. DeutschE. Räuchle OriginalPaper Pages: 501 - 514
14C dating of ancient rock art: A new application of plasma chemistry J. RussM. HymanM. W. Rowe OriginalPaper Pages: 515 - 527
Entrainment of cold gas into thermal plasma jets E. PfenderJ. FinckeR. Spores OriginalPaper Pages: 529 - 543
Mass transfer from copper melts by top-blowing of an argon-hydrogen plasma jet O. BarinH. WilhelmiI. Barin OriginalPaper Pages: 545 - 559
Selective condensation during relaxation of multicomponent gas-plasma mixtures B. M. SmirnovN. P. Tishchenko OriginalPaper Pages: 561 - 577