Abstract
The erosion of surfaces due to the interaction of particles (inert or reactive ions/atoms, electrons) and electromagnetic radiation with materials and the deposition of films on different substrates have become subjects of major interest, and therefore the object of extensive studies, as a consequence of the relevance of erosion and deposition processes in different technologies. Recent reviews(1–4) have shown that the processes mentioned above can produce texturing of surfaces due to ion bombardment or vapor deposition. It has been demonstrated in those reviews that textured surfaces already are used in some technologies, have the potential to be useful in others, and are relevant either on detrimental or beneficial bases in different experimental techniques.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
O. Auciello . Ion Interaction with Solids: Surface Texturing, Some Bulk Effects, and Their Possible Applications. J. Vac. Sci. Techno. 19 (1981)841–867.
O. Auciello: Fundamentals and Applications, Chs. 1 and 11. Eds. O. Auciello and R. Kelly ( Elsevier Science Publishers, The Netherlands, 1984 ).
J. M. E. Harper, J. J. Cuomo, and H. R. Kaufman. Technology and Applications of Broad-Beam Ion Sources Used in Sputtering; PartII: Applications. J. Vac. Sci. Technol. 21(1982)737–756.
J. M. E. Harper, J. J. Cuomo, R. J. Gambino, and H. R. Kaufman. 1Ion Bombardment Modification of Surfaces: Fundamentals and Applications, Ch. 4. Eds. O. Auciello and R. Kelly (Elsevier Science Publishers, The Netherlands, 1984)pp.127–162.
A. R. Bayly . Secondary Processes in the Evolution of Sputter-Topographies. J. Mater. Sci. 7(1972)404–412.
I. H. Wilson. The Topography of Sputtered Semiconductors. Rad. Eff. 18, (1973)95–103.
G. Carter and M. J. Nobes. Ion Bombardment Modification of Surfaces: Fundamentals and Applications, Ch. 5. Eds. O. Auciello and R. Kelly (Elsevier Science Publishers, 1984)pp.163–224.
R. E. Chapman . Redeposition: a Factor in Ion-Beam Etching Topography. J. Mater. Sci. 12(1977)1125–1133.
O. Auciello, R. Kelly, and R. Iricibar. On the Problem of the Stability of Pyramidal Structures on Bombarded Copper Surfaces. Rad. Eff. Lett. 43 (1979) 37–42.
O. Auciello and R. Kelly. On the Relative Stability of Different Topographical Features Developed on Bombarded Copper Surfaces. Rad. Eff. Lett. 43(1979)187–192.
O. Auciello and R. Kelly. Further Experimental Evidence on the Importance of Tertiary Effects in the Evolution of Pyramids on Bombarded Copper. Rad. Eff. Lett. 43(1979)117–123.
O. Auciello, R. Kelly, and R. Iricibar. New Insight into the Development of Pyramidal Structures on Bombarded Copper Surfaces. Rad. Eff. 46 105–118.
O. Auciello and R. Kelly. On the Role of the Primary Beam and of Scattered or Sputtered Particles in the Faceting of Cones on Bombarded Surfaces. Nucl. Inst. Meth. 182/183(1981)267–273.
G. W. Lewis, J. S. Colligon, F. Paton, M. J. Nobes, G. Carter, and J. L. Whitton. The Life Cycle of Copper Cones. Rad. Eff. Lett. 43(1979)49–54.
G. Carter, M. J. Nobes, G. W. Lewis, and J. L. Whitton. 1Combined Sputtering Yield and Surface Topography Development Studies on Si. Proc. Symp. Sputtering, Eds. P. Varga, G. Betz, and F. P. Viehböck (Inst, für Allgemeine Phys. Tech. Univ. Wien, 1980)pp.604–613.
H. I. Smith. In Proceedings of the Symposium on Etching for Pattern Definition, Electrochemical Society, 1976, Eds. M. G. Hughes and M. , pp. 133.
J. Belson and I. H. Wilson. Flux Density Equations for Topographical Evolution of Features on Ion Bombarded Surfaces. Rad. Eff. 51(1980)27–34.
J. Belson and I. H. Wilson. 1Equations for Redeposition of Sputtered Flux onto Surface Asperities. In Symposium on Sputtering, Eds. P. Varga, G. Betz, and F. P. Viehböck (Inst, für Allgemeine Phys. Tech. Univ. Wien, 1980)pp.574–583.
J. Belson and I. H. Wilson. Theory of Redeposition of Sputtered Flux onto Surface Asperities. Nucl. Instr. Meth. 182/183(1980)275–281.
I. H. Wilson, S. S. Todorov, and D. S. Karpuzov. Profile Evolution During Ion Beam Etching of Germanium Targets. Nucl. Instr. Meth. 209 /210 (1983) 549–554.
R. Smith, S. S. Makh, and J. M. Walls. Surface Morphology During Ion Etching: The Influence of Redeposition. Phil. Maq. A47(1983)453–481.
R. Smith, M. A. Tagg, and J. M. Walls. Deterministic Model of Ion Erosion, Reflection and Redeposition. Vacuum 34(1984)175–180.
R. Kelly and O. Auciello. On the Origin of Pyramids and Cones on Ion-Bombarded Copper Surfaces. Surf. Sci. 100(1980)135–153.
R. S. Robinson and S. M. Rossnagel. Monte Carlo Model of Topography Development During Sputtering. J. Vac. Sci. Technol. A1(1983)426–429.
A. Güntherschülze and W. Tollmien. Neve Unterscuchungen über die Kathodenzerstäubung der Glimmentladung. Z. Phys. 119(1942)685–695.
O. Auciello (unpublished, 1980).
O. Auciello and R. Kelly.1 The Evolution of Pyramidal Structures on Surfaces Bombarded at 60°. In Symposium on Sputtering, Eds. P. Varga, G. Betz, and F. P. Viehböck (Inst, für Allgemeine Phys. Tech. Univ. Wien, 1980)594–603.
O. Auciello and R. Kelly. The Evolution of Pyramidal Structures on Surfaces Bombarded at Oblique Angles. Rad. Eff. 66(1982)195–210.
G. W. Lewis, G. Carter, M. J. Nobes, and S. A. Cruz. The Development of Tailed-Cones on Non-Normal Incidence Ion Bombarded Solids. Rad. Eff. Lett. 58(1981)119–124.
H. Wilson, J. Belson, and O. Auciello. Secondary Effects in Ion Bombardment-Induced Surface Erosion. In Ion Bombardment Modification of Surfaces: Fundamentals and Applications, Ch. 6 Eds. O. Auciello and R. Kelly (Elsevier Science Publishers, The Netherlands, 1984)pp.225–297.
H. H. Andersen and H. L. Bay. Sputtering Yield Measurements. Sputtering by Particle Bombardment I, Ed. R. Behrisch (Topics in Applied Physics, Springer Verlag, 1981)pp.145–218.
R. Kelly and O. Auciello. On the Origin of Pyramids and Cones on Ion- Bombarded Copper Surfaces. Surf. Sci. 100(1980)135–153.
M. Hou and M. T. Robinson. The Conditions for Total Reflection of Low-Energy Atoms from Crystal Surfaces. Appl. Phys. 17(1978)371–375.
D. Ghose, D. Basu, and S. B. Karmohapatro. Cone Formation on Argon-Bombarded Copper. J. Appl. Phys. 54(1983)1169–1171.
N. N. Efremow, M. W. Geis, D. C. Flanders, G. A. Lincoln, and N. P. Economou. Ion Beam-Assisted Etching of Diamond. J. Vac. Sci. Technol. B3(1985)416–418.
R. L. Kubena, R. L. Seliger, and E. H. Stevens. High Resolution Sputtering Using a Focused Ion Beam. Thin Solid Films 92(1982)165–169.
T. Kato, H. Morimoto, K. Saitoh, and H. Nakata. Submicron Pattern Fabrication by Focused Ion Beams. J. Vac. Sci. Technol. B3(1985)50–53.
P. G. Glöersen. Ion Beam Etching. J. Vac. Sci. Technol. 12(1975)28–35.
H. Dimigen and H. Lüthje. An Investigation of Ion Etching. Philips Tech. Rev. 35(1975)199–208.
R. E. Lee. Microfabrication by Ion Beam Etching. J. Vac. Sci. Technol. 16(1979)164–170.
V. M. Donnelly, D. E. Ibbotson, and D. L. Flamm. Fundamental Aspects of Plasma-Surface Interactions and The Etching Process. In “Ion Bombardment Modification of Surfaces: Fundamentals and Applications,” Ch. 8, Eds. O. Auciello and R. Kelly (Elsevier Science Publishers, 1984)323–359.
H. W. Lehmann, L. Krausbauer, and R. Widmer. Redeposition — A Serious Problem in R.F. Sputter Etching of Structures with Micrometer Dimensions. J. Vac. Sci. Technol. 14(1977)281–284.
O. Auciello, A. A. Haasz, and P. C. Stangeby. Synergism in Materials Erosion Due to Multispecies Impact. Rad. Eff. 89(1985)63–101.
Auciello. Recent Progress in Understanding Ion Bombardment-Induced Synergism in the Erosion of Carbon Due to Multispecies Impact. Nucl. Instr. Meth. B(in press).
D. L. Flamm and V. M. Donnelly. The Design of Plasma Etchants. Plasma Chem. and Plasma Processing 1(1981)317–363.
L. F. Johnson, K. A. Ingersoll, and D. Kahng. Planarization of Patterned Surfaces by Ion Beam Erosion. Appl. Phys. Lett. 40(1982)636–638.
G. D. Boyd, L. A. Coldren, and F. G. Storz. Directiona1 Reactive Ion Etching at Oblique Angles. Appl. Phys. Lett. 36(1980)583–585.
D. E. Prober, M. D. Feuer, and N. Giordano. Fabrication of 300A Metal Lines with Substrate-Step Techniques. Appl. Phys. Lett. 37(1980)94–96.
M. K. Sullivan and G. A. Kolb. Direct Photoetching of Evaporated Germanium and Its Use in Mask Fabrication. Electrochem. Techn. 6(1968)430–434.
L. L. Sveshnikova, V. I. Donin, and S. M. Repinskii. Initiation of Bromine-Silicon Reaction by a High-Power Argon Laser. Sov. Tech. Phys. Lett. 3(1977)223–224.
M. Beterov, V. P. Chebotaev, N. I. Yurshima, and B. Ya. Yurshin. Effect of the Laser Radiation Intensity on the Kinetics of the Heterogeneous Photochemical Reaction Between Single-Crystal Germanium and Bromine Gas. Sov. J. Quantum Electron. 8(1978)1310–1315.
a) J. Ehrlich, R. M. Osgood, Jr., and T. F. Deutsch. Laser-Induced Microscopic Etching of GaAs and InP; Appl. Phys. Lett. 36(1980)698–700. (b) Laser Chemical Technique for Rapid Direct Writing of Surface Relief in Silicon; Appl. Phys. Lett. 38(1981)1018–1020. (c) Laser Photochemical Microalloying for Etching of Aluminum Thin Films; Appl. Phys. Lett. 38 (1981)399–401.
T. J. Chuang. Infrared Laser-Induced Reactions at Metal and Semiconductor Surfaces. J. Vac. Sci. Technol. 18(1981)638–642.
T. F. Deutsch, D. J. Erlich, and R. M. Osgood, Jr. Laser Photodeposition of Metal Films with Microscopic Features. Appl. Phys. Lett. 35(1979)175–177.
S. D. Allen and M. Bass. Laser Chemical Vapor Deposition of Metals and Insulators. J. Vac. Sci. Technol 16(1979)431.
R. J. von Gutfeld, E. E. Tynan, R. L. Melcher, S. E. Blum. Appl. Phys. Lett. 35(1979)651–653
T. J. Chuang. Infrared Laser-Induced Reaction of SF6 with Silicon Surfaces. J. Chem. Phys. 72(1980)6303–6304
T. J. Chuang . Multiple Photon Excited SF6 Interaction with Si 1 icon Surfaces. J. Chem. Phys. 74(1981)1453–1460.
P.Sigmund . Sputtering by Ion Bombardment: Theoretical Concepts. In “Sputtering by Particle Bombardment,” Ed. R. Behrisch (Springer Verlag, 1981)9–71
H. R. Deppe, B. Hasler, and J. Höepfner. Investigations on the Damage Caused by Ion Etching of SiO2 Layers at Low Energy and High Dose. Solid State Electron. 20(1977)51–55.
A. Yariv. Guided-Wave Optics. Scientific American (Jan. 1979) 64–72.
L. F. Johnson . Evolution of Grating Profiles Under Ion-Beam Erosion. Applied Optics 18(1979)2559–2574
L. F. Johnson K. A. Ingersoll. Interference Gratings Blazed by Ion- Beam Erosion. Appl. Phys. Lett. 35(1979)500–503
L. F. Johnson K. A. Ingersoll. Generation of Surface Gratings With Periods <1000Å. Appl. Phys. Lett. 38(1981)532–534
L. F. Johnson. Ion Beam Microstructure Fabrication in Optical, Magnetic and Surface Acoustical Technoloqies. In “Ion Bombardment Modification of Surfaces: Fundamentals and Applications,” Ch. 9, Eds. O. Auciello R. Kelly (Elsevier Science Publishers, 1984)361–397
H. G. Craighead R. E. Howard. Microscopically Textured Optical Storage Media. Appl. Phys. Lett. 39(1981)532–534
H. G. Craighead, R. E. Howard, J. E. Sweeney, D. M. Tennant. J. Vac. Sci. Technol. 20(1982)316–319
H. G. Craighead, R. E. Howard, P. F. Liao, D. M. Tennant, J. E. Sweeney. Textured Germanium Optical Storage Medium. Appl. Phys. Lett. 40(1982)662–664
R. G. Zech, SPIE 177,56. Optical Information Storage. Proc. of the “Symposium on Optical Storage Materials,” 1980. Proc. of “Outlook for Optical and Video Disc Systems and Applications,” Florida, 1981.
R. A. Bartolini . Media for High Density Optical Recording. J. Vac. Sci. Technol. 18(1981)70–74
“Surface Wave Filters, Design, Construction and Use”; Ed. H. Matthews ( John Wiley and Sons, NY, 1977 ).
M. Itoh, H. Gokan, S. Esko, K. Asakawa. Fabrication Process for Surface Acoustic Wave Filters Having 0.5µm Finger Period Electrodes. J. Vac. Sci. Technol. 20(1982)21–25
S. J. Marti, S. S. Schwartz, R. L. Gunshor, R. F. Pierret. Surface Acoustic Wave Resonators on a ZnO-on-Si Layered Medium. J. Appl. Phys. 54(1983)561–569
Thin Film Processes, Eds. J. L. Vossen and W. Kern ( Academic, New York, 1978 ).
A. G. Dirks H. J. Leamy. Columnar Microstructure in Vapor-Deposited Thin Films. Thin Solid Films 47(1977)219–233
J. A. Thornton . Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coatings. J. Vac. Sci. Technol. 11(1974)666–670.
J. M. E. Harper, J. J. Cuomo, R. J. Gambino, H. R. Kaufman. Modification of Thin Film Properties by Ion Bombardment During Deposition. In “Ion Bombardment Modification of Surfaces: Fundamentals and Applications.” Eds. O. Auciello R. Kelly (Elsevier Science Publishers, 1984)127– 159
J. Amano and R. P. W. Lawson. Thin-Film Deposition Using Low-Energy Ion Beams, Mg+lon-Beam Deposition and Analysis of Deposits. J. Vac. Sci. Technol. 14(1977)695–698.
R. D. Bland, G. J. Kominiak, D. M. Mattox. Effect of Ion Bombardment During Deposition on Thick Metal and Ceramic Deposits. J. Vac. Sci. Technol. 11(1974)671–674
E. H. Hirsch I. K. Varga. Thick Film Annealing by Ion Bombardment. Thin Solid Films 69(1980)99–105
T. Takagi . Role of Ions in Ion-Based Film Formation. Thin Solid Films 92(1982)1–17
P. J. Martin, H. A. MacLeod, R. P. Netterfield, C. G. Pacey, W. G. Sainty. Ion-Beam Assisted Deposition of Thin Films. Applied Optics 22 (1983)178–184
D.M. Mattox . Preparation of Thin Films for Solar Energy Utilization. J. Vac. Sci. Technol. 17(1980)370–373
J. C. Marinace . Tunnels in Semiconductor Epitaxy. IBM J. Res. Develop. 23(1979)459–461
Proceedings of the 31st National Symposium of the American Vaccum Society. J. Vac. Sci. Technol. A3, Part I and 11(1985).
L. J. Leger. Oxygen Atom Reaction with Shuttle Materials at Orbital Altitudes, NASA Tech. Memo TM-58246(1982).
B. A. Banks, M. J. Mirtich, S. K. Rutledge, and D. M. Swee. Sputtered Coatings for Protection of Spacecraft Polymers. NASA Tech. Memo 83706 (1984).
D. C. Ferguson. Laboratory Degradation of Kapton in a Low Energy Oxygen Ion Beam, NASA Tech. Memo TM-8353(1984).
O. Auciello . A Critical Review on the Origin, Stability, Relative Sputtering Yield and Related Phenomena of Textured Surfaces Under Ion Bombardment. Rad. Eff. 60(1982)1–26.
J. B. Angell, S. C. Terry, and P. W. Barth. Silicon Micromechanical Devices. Scientific American (April 1983)44–55.
B. A. Banks . Ion Bombardment Modification of Surfaces in Biomedical Applications. In “Ion Bombardment Modification of Surfaces: Fundamentals and Applications,” Eds. O. Auciello R. Kelly (Elsevier Science Publishers, 1984)399–434
T. E. Furtak J. Reyes. A Critical Analysis of Theoretical Models for the Giant Raman Effect from Adsorbed Molecules. Surf. Sci. 93(1980)351– 382
W. Keller, R. Klingelhöfer, B. Krevet, H. O. Moser, R. Ries. Influence of Surface Roughness on the Momentum Transfer by 350-keV Hydrogen-Cluster Ions. Rev. Sci. Instr. 55(1984)468–471
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1986 Martinus Nijhoff Publisher
About this chapter
Cite this chapter
Auciello, O. (1986). Problems, Prospects and Applications of Erosional/Depositional Phenomena. In: Kiriakidis, G., Carter, G., Whitton, J.L. (eds) Erosion and Growth of Solids Stimulated by Atom and Ion Beams. NATO ASI Series, vol 112. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-4422-0_23
Download citation
DOI: https://doi.org/10.1007/978-94-009-4422-0_23
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-8468-0
Online ISBN: 978-94-009-4422-0
eBook Packages: Springer Book Archive