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Secondary processes in the evolution of sputter-topographies

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Abstract

Topographies of silica glass surfaces developed by 20 keV Ar+ irradiation contain features which are not adequately explained by considering only the variation of sputtering yield with the ion-incidence angle. These features are sharply defined and could lead to serious misinterpretation of specimen structures when sputter-erosion is used as a microscopic sectioning technique. Three mechanisms are discussed which together could account for the observed discrepancies, the first being ion-reflection at grazing incidence, the second the phenomenon of forward-peaked emission of high-energy secondary particles under irradiation at high angles of incidence and the third being re-deposition of sputtered material onto closely adjacent planes. A general expression is derived for this latter mechanism for a cosine spatial distribution of sputtered particles.

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Bayly, A.R. Secondary processes in the evolution of sputter-topographies. J Mater Sci 7, 404–412 (1972). https://doi.org/10.1007/BF02403403

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  • DOI: https://doi.org/10.1007/BF02403403

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