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The design of plasma etchants

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Abstract

Theory and practice of plasma etching are critically reviewed. Some unifying principles are extended to explain a large body of experimental data, encompassing more than 20 substrate materials in dozens of etchant gas mixtures. These basic concepts can be used to select new etchants and plasma etching parameters.

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  1. Bell Laboratories, Murray Hill, 07974, New Jersey

    Daniel L. Flamm & Vincent M. Donnelly

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Flamm, D.L., Donnelly, V.M. The design of plasma etchants. Plasma Chem Plasma Process 1, 317–363 (1981). https://doi.org/10.1007/BF00565992

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