Abstract
Variations of the morphology and field-emission properties of surface-structured n- and p-type silicon wafers have been studied. The silicon surface has been structured by etching in a fluorine–carbon plasma and depositing subnanodimensional island carbon masks. It has been shown that surface structuring in a fluorine–carbon plasma makes it possible to reach desired field-emission currents in electric fields of different strengths. Physicochemical models of field emission mechanisms and models of destruction of surface-modified multipoint silicon array cathodes have been considered.
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This study was supported by the Russian Science Foundation, grant no. 16-19-10033.
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Translated by V. Isaakyan
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Yafarov, R.K. Tunnel Emission from Nanostructured Field-Emission Array Cathodes with a Fluorine–Carbon Coating. Tech. Phys. 64, 897–901 (2019). https://doi.org/10.1134/S1063784219060240
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DOI: https://doi.org/10.1134/S1063784219060240