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Effects of an α-Al2O3 thin film on the oxidation behavior of a single-crystal Ni-based superalloy

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Abstract

A ∼150-nm-thick coating layer consisting of α-Al2O3 as the major phase with a minute amount of Φ-Al2O3 was deposited on the surface of a single-crystal Ni-based superalloy by chemical vapor deposition (CVD). Within 0.5 hours of oxidation at 1150°C, the resulting thermally grown oxide (TGO) formed on the coated alloy surface underwent significant lateral grain growth. Consequently, within this time scale, the columnar nature of the TGO became established. After 50 hours, a network of ridges was clearly observed on the TGO surface instead of equiaxed grains typically observed on the uncoated alloy surface. Comparison of the TGO morphologies observed with and without the CVD-Al2O3 layer suggested that the transient oxidation of the alloy surface was considerably reduced. Also, the CVD-Al2O3 layer significantly reduced the growth rate of the TGO and improved its spallation resistance, while slowing the internal oxidation of Ta-rich areas that were present in the superalloy as-casting defects. These results demonstrated that this thin α-Al2O3 coating could be used as a means of favorably altering the TGO morphology and growth kinetics for no bond coat thermal barrier coating (TBC) applications.

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Authors and Affiliations

  1. Department of Chemical, Biochemical, and Materials Engineering, Stevens Institute of Technology, 07030, Hoboken, NJ

    Y. -F. Su (Postdooctoral Researcher) & W. Y. Lee (Professor)

  2. the Oak Ridge National Laboratory, 37831, Oak Ridge, TN

    L. F. Allard (Leader of the Materials Analysis User Center at High Temperature Materials Laboratory) & D. W. Coffey (Staff Member)

Authors
  1. Y. -F. Su
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  2. L. F. Allard
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  3. D. W. Coffey
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  4. W. Y. Lee
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Y.-F. SU, formerly Doctoral Candidate

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Su, Y.F., Allard, L.F., Coffey, D.W. et al. Effects of an α-Al2O3 thin film on the oxidation behavior of a single-crystal Ni-based superalloy. Metall Mater Trans A 35, 1055–1065 (2004). https://doi.org/10.1007/s11661-004-1008-5

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  • DOI: https://doi.org/10.1007/s11661-004-1008-5

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