An analysis of experimental data revealed the dependence of the metal/n-GaN GaN(0001) barrier height on the metal work function, as predicted by the model that takes into account the charge neutrality level of the semiconductor. In case of the metal/p-GaN(Mg) barriers, significant scatter of the corresponding experimental data is observed and pinning of the near-surface Fermi level near E v + 2.5 eV takes place in most structures, which is due to the influence of high density of interface defect states formed during the process of the GaN doping by Mg impurity.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 11, pp.121–126, November, 2015.
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Brudnyi, V.N. Gallium Nitride: Charge Neutrality Level and Interfaces. Russ Phys J 58, 1613–1618 (2016). https://doi.org/10.1007/s11182-016-0691-1
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DOI: https://doi.org/10.1007/s11182-016-0691-1