1. The status of deep X-ray lithography in the UK for the development of precision microstructures

   • D. W. L. Tolfree

   Pages: 51 - 55

2. A hard X-ray prototype production exposure station at NSLS

   • E. D. Johnson
   • J. C. Milne

   Pages: 56 - 57

3. New LIGA exposure source in China

   • E. Tang
   • F. Yi
   • D. Chen

   Pages: 58 - 60

4. Study on fabrication of high aspect ratio MEMS microparts using a compact SR beamline

   • S. Sugiyama
   • Y. Zhang
   • R. Maeda

   Pages: 61 - 63

5. High speed hydraulic scanner for deep X-ray lithography

   • J. C. Milne
   • E. D. Johnson

   Pages: 64 - 65

6. High precision, low cost mask for deep x-ray lithography

   • B.-Y. Shew
   • Y. Cheng
   • W. H. Lee

   Pages: 66 - 69

7. X-Ray masks for very deep X-Ray lithography

   • J. Klein
   • H. Guckel
   • E. D. Johnson

   Pages: 70 - 73

8. Fabrication of intermediate mask for deep x-ray lithography

   • T. Sheu
   • M. H. Chiang
   • S. Su

   Pages: 74 - 76

9. Enhanced adhesion of PMMA to copper with black oxide for electrodeposition of high aspect ratio nickel-iron microstructures

   • V. K. P. Kanigicherla
   • K. W. Kelly
   • M. C. Murphy

   Pages: 77 - 81

10. Dosage modeling for deep x-ray lithography application

    • W.-P. Shih
    • G.-J. Hwang
    • Y. Cheng

    Pages: 82 - 85

11. Characterization of exposure and processing of thick PMMA for deep x-ray lithography using hard x-rays

    • F. De Carlo
    • D. C. Mancini
    • J. J. Song

    Pages: 86 - 88

12. Characterisation of defects in very high deep-etch X-ray lithography microstructures

    • F. J. Pantenburg
    • S. Achenbach
    • J. Mohr

    Pages: 89 - 93

13. New development strategies for high aspect ratio microstructures

    • J. Zanghellini
    • S. Achenbach
    • F. J. Pantenburg

    Pages: 94 - 97

14. Modeling electrodeposition for LIGA microdevice fabrication

    • S. K. Griffiths
    • R. H. Nilson
    • J. M. Hruby

    Pages: 98 - 101