Abstract
An advanced light source has been proposed by Municipality of Shanghai and the Chinese Academy of Sciences. It would be scheduled in the beginning of next century. The main propose is for the fundamental scientific research and industrial application etc. The parameters of Shanghai Synchrotron Radiation Facility (SSRF) are listed. The LIGA experimental station are planned to build in the first phase of construction of SSRF.
Main parameters, spectrum and power density of beam lines for deep etching lithography are illustrated.
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Received: 25 August 1997/Accepted: 3 September 1997
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Tang, E., Yi, F., Zhang, S. et al. New LIGA exposure source in China. Microsystem Technologies 4, 58–60 (1998). https://doi.org/10.1007/s005420050094
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DOI: https://doi.org/10.1007/s005420050094