1. Fabrication and characteristics of A Te-Se-CdO structure

   • M. Altmejd
   • C. H. Champness

   OriginalPaper Pages: 363 - 381

2. Impurity states in cobalt-doped silicon

   • A. O. Evwaraye

   OriginalPaper Pages: 383 - 401

3. Auger, ellipsometry, and environmental studies of thin films applied to schottky (MIS) solar cells

   • J. K. Kim
   • W. A. Anderson
   • A. E. Delahoy

   OriginalPaper Pages: 403 - 414

4. The effect of cathode materials on reactive ion etching of silicon and silicon dioxide in a CF₄ plasma

   • L. M. Ephrath

   OriginalPaper Pages: 415 - 428

5. Optical detector to monitor plasma etching

   • W. R. Harshbarger
   • R. A. Porter
   • P. Norton

   OriginalPaper Pages: 429 - 440

6. Silicon ribbon growth via the ribbon-to-ribbon (RTR) technique: Process update and material characterization

   • R. W. Gurtler
   • A. Baghdadi
   • I. A. Lesk

   OriginalPaper Pages: 441 - 477

7. Mechanical behavior of a composite printed-wiring-board material

   • Charles B. Wray
   • Charles W. Bert

   OriginalPaper Pages: 479 - 498