Abstract
A simple photodetector has been developed to monitor plasma etching of polysilicon, pyrolytic silicon nitride and reactive plasma deposited silicon nitride.
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Harshbarger, W.R., Porter, R.A. & Norton, P. Optical detector to monitor plasma etching. J. Electron. Mater. 7, 429–440 (1978). https://doi.org/10.1007/BF02655647
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DOI: https://doi.org/10.1007/BF02655647