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Demagnification Imaging Improved by Mask in a Hyperlens Photolithography System

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Abstract

Hyperlens, composed by curved dielectric-metal layers, are often used in photolithography systems to realize demagnification imaging in subwavelength scale. Most studies are focused on the design of the hyperlens for resolution enhancement. Here, we show the demagnification imaging can also be improved by the mask. It is found that the demagnification ratio can be increased by 14.5 % when a silver rather than a chromium mask is used. An image with a half-pitch resolution of about one tenth of the operating wavelength can be achieved if the mask material and thickness are properly selected. The image contrast can also be promoted by introducing a phase-shifting layer on the top of the mask.

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Acknowledgments

This work was supported by the National Basic Research Program of China (973 Program Grant No. 2013CBA01702), the National Natural Science Founding of China (Grant NOs 61405012 and 61420106014), NCET, and Excellent young scholars Research Fund of Beijing Institute of Technology.

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Authors and Affiliations

  1. Beijing Engineering Research Center for Mixed Reality and Advanced Display, School of Optoelectronics, Beijing Institute of Technology, Beijing, 100081, China

    Biao Li, Bin Hu, Yuliang Yang, Zi Wang, Juan Liu & Yongtian Wang

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  1. Biao Li
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  2. Bin Hu
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  3. Yuliang Yang
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  4. Zi Wang
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  5. Juan Liu
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  6. Yongtian Wang
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Correspondence to Bin Hu, Juan Liu or Yongtian Wang.

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Li, B., Hu, B., Yang, Y. et al. Demagnification Imaging Improved by Mask in a Hyperlens Photolithography System. Plasmonics 12, 735–741 (2017). https://doi.org/10.1007/s11468-016-0320-4

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  • DOI: https://doi.org/10.1007/s11468-016-0320-4

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