Abstract
Off axis illumination (OAI) technique combined with planar hyperlens is applied to achieve the non-contacted deep subwavelength demagnifying lithography. The designed OAI is confirmed to shift the spatial spectra of mask, leading to enhancement of the featured wavevectors components. On the other hand, the reflection effect of Ag cladding is necessary to obtain high contrast and high fidelity of nanopattern lithography. It is numerically demonstrated that the half-pitch resolution 32 nm with OAI (NA = 1.37) is obtained under 80 nm air working distance, which is about six times than the case of the conventional configuration under normal illumination (NA = 0). Further simulations show that the minimum half-pitch resolution of the planar hyperlens with OAI could reach 18 nm (∼λ/20).
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Pendry JB (2000) Negative refraction makes a perfect lens. Phys Rev Lett 85:3966–3969
Fang N, Lee H, Sun C, Zhang X (2005) Sub-diffraction-limited optical imaging with a silver superlens. Science 308:534–537
Jacob Z, Alekseyev LV, Narimanov E (2006) Optical-hyperlens: Far-field imaging beyond the diffraction limit. Opt Express 14:8247–8256
Shao DB, Chen SC (2008) Surface plasmon assisted contact scheme nanoscale photolithography. J Vac Sci Technol B 26:227–231
Liu H, Wang B, Ke L, Deng J, Chum CC, Teo SL, Shen L, Maier SA, Teng JH (2012) High aspect subdiffraction-limit photolithography via a silver superlens. Nano Lett 12:1549–1554
Arnold MD, Blaikie RJ (2007) Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs. Opt Express 15:11542–11552
Wang CT, Gao P, Zhao ZY, Yao N, Wang YQ, Liu L, Liu KP, Luo XG (2013) Deep sub-wavelength imaging lithography by a reflective plasmonic slab. Opt Express 21:20683–20691
Ren GW, Wang CT, Yi GW, Tao X, Luo XG (2013) Subwavelength demagnification imaging and lithography using hyperlens with a plasmonic reflector layer. Plasmonics 8:1065–1072
Xiong Y, Liu ZW, Zhang X (2009) A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm. Appl Phys Lett 94:203108
Wong AK (2001) Resolution enhancement techniques in optical lithography. (SPIE Press)
Luehrmann P, Oorcshot PV, Jasper H, Stalnaker S, Brainerd S, Rolfson B, Karklin L (1993) 0.35 μm Lithography using off axis illumination. Proc SPIE 1927:103–124
Huang QZ, Wang CT, Yao N, Zhao ZY, Wang YQ, Gao P, Luo YF, Zhang W, Wang H, Luo XG (2014) Improving imaging contrast of non-contacted plasmonic lens by off-axis illumination with high numerical aperture. Plasmonics 9:699–706
Wang W, Lin L, Yang XF, Cui JH, Du CL, Luo XG (2008) Design of oblate cylindrical perfect lens using coordinate transformation. Opt Express 16:8094–8105
Tao X, Wang CT, Zhao ZY, Wang YQ, Yao N, Luo XG (2014) A method for uniform demagnification imaging beyond the diffraction limit: cascaded planar hyperlens. Appl Phys B 114:545–550
Palik ED (1985) The handbook of optical constants of solids. (Academic Press)
Johnson B, Christy RW (1972) Optical constants of the noble metal. Phys Rev B 6:4370–4379
Maier SA (2006) Plasmonics: Fundamentals and applications. Springer, Berlin
Acknowledgments
This work was supported by 973 Program of China (No. 2013CBA01700) and National Natural Science Funds (61138002, 61177013).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Zhang, W., Yao, N., Wang, C. et al. Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography. Plasmonics 9, 1333–1339 (2014). https://doi.org/10.1007/s11468-014-9746-8
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11468-014-9746-8