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Nanoimprint lithography: an enabling technology for nanophotonics

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Abstract

Nanoimprint lithography (NIL) is an indispensable tool to realize a fast and accurate nanoscale patterning in nanophotonics due to high resolution and high yield. The number of publication on NIL has increased from less than a hundred per year to over three thousand per year. In this paper, the most recent developments on NIL patterning transfer processes and its applications on nanophotonics are discussed and reviewed. NIL has been opening up new opportunities for nanophotonics, especially in fabricating optical meta-materials. With more researches on this low-cost high-throughput fabrication technology, we should anticipate a brighter future for nanophotonics and NIL.

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Authors and Affiliations

  1. University of Southern California, Los Angeles, CA, USA

    Yuhan Yao, He Liu, Yifei Wang, Yuanrui Li, Boxiang Song & Wei Wu

  2. Corning Inc., Corning, NY, USA

    Alexandre Bratkovsk

  3. WWSens Devices Inc., Los Altos, CA, USA

    Shih-Yuan Wang

Authors
  1. Yuhan Yao
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  2. He Liu
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  3. Yifei Wang
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  4. Yuanrui Li
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  5. Boxiang Song
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  6. Alexandre Bratkovsk
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  7. Shih-Yuan Wang
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  8. Wei Wu
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Correspondence to Wei Wu.

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Yao, Y., Liu, H., Wang, Y. et al. Nanoimprint lithography: an enabling technology for nanophotonics. Appl. Phys. A 121, 327–333 (2015). https://doi.org/10.1007/s00339-015-9438-z

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  • DOI: https://doi.org/10.1007/s00339-015-9438-z

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