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Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography

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Abstract

Two types of optical metamaterials operating at near-IR and mid-IR frequencies, respectively, have been designed, fabricated by nanoimprint lithography (NIL), and characterized by laser spectroscopic ellipsometry. The structure for the near-IR range was a metal/dielectric/metal stack “fishnet” structure that demonstrated negative permittivity and permeability in the same frequency region and hence exhibited a negative refractive index at a wavelength near 1.7 μm. In the mid-IR range, the metamaterial was an ordered array of fourfold symmetric L-shaped resonators (LSRs) that showed both a dipole plasmon resonance resulting in negative permittivity and a magnetic resonance with negative permeability near wavelengths of 3.7 μm and 5.25 μm, respectively. The optical properties of both metamaterials are in agreement with theoretical predictions. This work demonstrates the feasibility of designing various optical negative-index metamaterials and fabricating them using the nanoimprint lithography as a low-cost, high-throughput fabrication approach.

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Authors and Affiliations

  1. Quantum Science Research, Hewlett-Packard Laboratories, Palo Alto, CA, 94304, USA

    W. Wu, E. Ponizovskaya, Z. Yu, A.M. Bratkovsky, W. Tong, S.-Y. Wang & R.S. Williams

  2. Department of Physics, University of California, Berkeley, CA, 94720, USA

    E. Kim & Y.R. Shen

  3. NSF Nano-scale Science and Engineering Center (NSEC), University of California, Berkeley, CA, 94720, USA

    Y. Liu, C. Sun & X. Zhang

  4. Department of Mechanical & Industrial Engineering, University of Illinois, Urbana-Champagne, IL, 61801, USA

    N. Fang

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  1. W. Wu
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  2. E. Kim
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  3. E. Ponizovskaya
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  4. Y. Liu
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  5. Z. Yu
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  8. A.M. Bratkovsky
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  9. W. Tong
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  12. S.-Y. Wang
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  13. R.S. Williams
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Correspondence to W. Wu.

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PACS

42.25.Bs; 81.16.Nd; 42.70.-a; 81.07.-b

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Wu, W., Kim, E., Ponizovskaya, E. et al. Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography. Appl. Phys. A 87, 143–150 (2007). https://doi.org/10.1007/s00339-006-3834-3

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  • DOI: https://doi.org/10.1007/s00339-006-3834-3

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