1. Electrochemical Process Makes Ultrasmall Si Nanoparticles

   Research/Researchers 01 June 2000 Pages: 4 - 4

2. “Left-Handed” Composite Materials Respond to Electromagnetic Radiation

   Research/Researchers 01 June 2000 Pages: 4 - 5

3. Steel-Recycling Innovation Includes Aluminum to Control Impurities

   Research/Researchers 01 June 2000 Pages: 5 - 6

4. Si Nanowires Produced with Aid of Gold Quantum Dots

   Research/Researchers 01 June 2000 Pages: 6 - 6

5. Nanoclusters of Metallic Gold Display Optical Chiral Properties

   Research/Researchers 01 June 2000 Pages: 6 - 7

6. Feedback-Controlled Lithography Enables Molecule Manipulation on Atomic Scale

   Research/Researchers 01 June 2000 Pages: 7 - 7

7. Single-Isotope Silicon Helps Chips Keep Their Cool

   Research/Researchers 01 June 2000 Pages: 7 - 7

8. Hysteresis and Spikes Observed in Quantum Hall Effect

   Research/Researchers 01 June 2000 Pages: 7 - 8

9. Lattice-Dynamics Properties May Explain Low Dielectric Constant of Thin Films

   • Jidong Hou

   Research/Researchers 01 June 2000 Pages: 8 - 8

10. Chiral Diarylethene Dopant Induces Large Photostimulated Pitch Change in Nematic Liquid Crystals

    • Zhengmao Zhu

    Research/Researchers 01 June 2000 Pages: 8 - 8

11. Intraband Electron Energy Relaxation in CdSe Quantum Dots is Dominated by Coulombic Coupling Between Electrons and Holes

    • Yuhang Ren

    Research/Researchers 01 June 2000 Pages: 8 - 9

12. Washington News

    News 01 June 2000 Pages: 11 - 12

13. Resources

    Announcement 01 June 2000 Pages: 13 - 13

14. Defects and Diffusion in Silicon Technology

    • Tony E. Haynes

    Technical Feature 01 June 2000 Pages: 14 - 17

15. Scaling Transistors into the Deep-Submicron Regime

    • Paul A. Packan

    Technical Feature 01 June 2000 Pages: 18 - 21

16. Diffusion Mechanisms and Intrinsic Point-Defect Properties in Silicon

    • Hartmut Bracht

    Technical Feature 01 June 2000 Pages: 22 - 27

17. Intrinsic Point Defects and Their Control in Silicon Crystal Growth and Wafer Processing

    • R. Falster
    • V. V. Voronkov

    Technical Feature 01 June 2000 Pages: 28 - 32

18. Advanced Gettering Techniques in ULSI Technology

    • A. A. Istratov
    • H. Hieslmair
    • E. R. Weber

    Technical Feature 01 June 2000 Pages: 33 - 38

19. Enhanced Diffusion in Silicon Processing

    • Nicholas Cowern
    • Conor Rafferty

    Technical Feature 01 June 2000 Pages: 39 - 44

20. Simulation of Defects and Diffusion Phenomena in Silicon

    • Mark E. Law
    • George H. Gilmer
    • Martin Jaraíz

    Technical Feature 01 June 2000 Pages: 45 - 50

21. JMR Launches Electronic Submission Database

    MRS news 01 June 2000 Pages: 51 - 51

22. Materials Researcher Switches from Brake Rotor Materials to Crash Dummies

    • Alan Taub

    Career Clips 01 June 2000 Pages: 51 - 52

23. Library

    Announcement 01 June 2000 Pages: 52 - 53