Fabrication and characteristics of A Te-Se-CdO structure M. AltmejdC. H. Champness OriginalPaper Pages: 363 - 381
Auger, ellipsometry, and environmental studies of thin films applied to schottky (MIS) solar cells J. K. KimW. A. AndersonA. E. Delahoy OriginalPaper Pages: 403 - 414
The effect of cathode materials on reactive ion etching of silicon and silicon dioxide in a CF4 plasma L. M. Ephrath OriginalPaper Pages: 415 - 428
Optical detector to monitor plasma etching W. R. HarshbargerR. A. PorterP. Norton OriginalPaper Pages: 429 - 440
Silicon ribbon growth via the ribbon-to-ribbon (RTR) technique: Process update and material characterization R. W. GurtlerA. BaghdadiI. A. Lesk OriginalPaper Pages: 441 - 477
Mechanical behavior of a composite printed-wiring-board material Charles B. WrayCharles W. Bert OriginalPaper Pages: 479 - 498