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Patterning graphene nanostripes in substrate-supported functionalized graphene: A promising route to integrated, robust, and superior transistors

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Abstract

It is promising to apply quantum-mechanically confined graphene systems in field-effect transistors. High stability, superior performance, and large-scale integration are the main challenges facing the practical application of graphene transistors. Our understandings of the adatom-graphene interaction combined with recent progress in the nanofabrication technology indicate that very stable and high-quality graphene nanostripes could be integrated in substrate-supported functionalized (hydrogenated or fluorinated) graphene using electron-beam lithography. We also propose that parallelizing a couple of graphene nanostripes in a transistor should be preferred for practical application, which is also very useful for transistors based on graphene nanoribbon.

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Authors and Affiliations

  1. Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei, 230031, China

    Liang-feng Huang & Zhi Zeng

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  1. Liang-feng Huang
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  2. Zhi Zeng
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Correspondence to Zhi Zeng.

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Huang, Lf., Zeng, Z. Patterning graphene nanostripes in substrate-supported functionalized graphene: A promising route to integrated, robust, and superior transistors. Front. Phys. 7, 324–327 (2012). https://doi.org/10.1007/s11467-011-0239-3

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  • DOI: https://doi.org/10.1007/s11467-011-0239-3

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