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Designing Atmospheric-Pressure Plasma Sources for Surface Engineering of Nanomaterials

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Abstract

Atmospheric-pressure plasma processing techniques emerge as efficient and convenient tools to engineer a variety of nanomaterials for advanced applications in nanoscience and nanotechnology. This work presents different methods, including using a quasi-sinusoidal high-voltage generator, a radio-frequency power supply, and a uni-polar pulse generator, to generate atmospheric-pressure plasmas in the jet or dielectric barrier discharge configurations. The applicability of the atmospheric-pressure plasma is exemplified by the surface modification of nanoparticles for polymeric nanocomposites. Dielectric measurements reveal that representative nanocomposites with plasma modified nanoparticles exhibit notably higher dielectric breakdown strength and a significantly extended lifetime.

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Authors and Affiliations

  1. School of Electrical Engineering and Telecommunications, The University of New South Wales, Sydney, NSW, 2052, Australia

    Wei Yan & B. Toan Phung

  2. Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, Lindfield, NSW, 2070, Australia

    Wei Yan, Zhao Jun Han & Kostya Ostrikov

  3. School of Electrical Engineering, Beijing Jiaotong University, Beijing, 100044, People’s Republic of China

    Wen Zheng Liu

  4. State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan, Hubei, 430074, People’s Republic of China

    Xin Pei Lu & Kostya Ostrikov

  5. Complex Systems@School of Physics, The University of Sydney, Sydney, NSW, 2006, Australia

    Kostya Ostrikov

Authors
  1. Wei Yan
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  2. Zhao Jun Han
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  3. Wen Zheng Liu
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  4. Xin Pei Lu
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  5. B. Toan Phung
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  6. Kostya Ostrikov
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Correspondence to Kostya Ostrikov.

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Yan, W., Han, Z.J., Liu, W.Z. et al. Designing Atmospheric-Pressure Plasma Sources for Surface Engineering of Nanomaterials. Plasma Chem Plasma Process 33, 479–490 (2013). https://doi.org/10.1007/s11090-013-9441-0

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  • DOI: https://doi.org/10.1007/s11090-013-9441-0

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