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Deposition of amorphous chromium layers

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Abstract

Deposition of amorphous chromium-carbon layers is possible from a trivalent chromium electrolyte containing 0.6 mol/l formic acid. The formation of chromium/formic acid complexes inhibits the aging of the electrolyte and the oligomerization. Deposition of a 15–20 μm thick chromium film is possible with DC condition. Thicker films can be deposited with pulse plating using reversed pulse sequences and pulse lengths in the millisecond region. The optimized conditions concerning pulse current densities and pulse times were determined and the composition and morphology of the films investigated.

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Authors and Affiliations

  1. Physikalische Chemie und Elektrochemie, Technische Universität Dresden, 01062, Dresden, Germany

    Waldfried Plieth

  2. ancosys GmbH, Pharmapark Radebeul, Meissner Str. 191, 01445, Radebeul, Germany

    Norbert Schröder

  3. Atotech Deutschland GmbH, Erasmusstraße 20, 10553, Berlin, Germany

    Birgit Sonntag

Authors
  1. Norbert Schröder
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  2. Birgit Sonntag
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  3. Waldfried Plieth
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Correspondence to Waldfried Plieth.

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Schröder, N., Sonntag, B. & Plieth, W. Deposition of amorphous chromium layers. J Solid State Electrochem 16, 3551–3558 (2012). https://doi.org/10.1007/s10008-012-1826-0

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  • DOI: https://doi.org/10.1007/s10008-012-1826-0

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