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Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

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Abstract

Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO2 powder, Al powder and N2 gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm−1 for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.

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Acknowledgements

The authors would like to pay their sincere thanks to Prof. Prita Pant, Department of Metallurgical Engineering and Materials Science, IIT Bombay for providing support of Nanoindentation facility.

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Authors and Affiliations

  1. Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim, India

    Soham Das, Spandan Guha, Ranjan Ghadai, Dhruva Kumar & Bibhu P. Swain

  2. Nano-Processing Laboratory, Centre for Material Science and Nanotechnology, Sikkim Manipal Institute of Technology, Sikkim, India

    Soham Das, Spandan Guha, Ranjan Ghadai, Dhruva Kumar & Bibhu P. Swain

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  1. Soham Das
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  2. Spandan Guha
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  3. Ranjan Ghadai
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Correspondence to Bibhu P. Swain.

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Das, S., Guha, S., Ghadai, R. et al. Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films. Appl. Phys. A 123, 412 (2017). https://doi.org/10.1007/s00339-017-1032-0

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