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Weak Absorbance Measurement of Optical Thin Films Using the Laser Photothermal Deflection Technique

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Photoacoustic and Photothermal Phenomena

Part of the book series: Springer Series in Optical Sciences ((SSOS,volume 58))

Abstract

It is important to measure the weak absorbance of optical thin films in order to improve the technique of coating optical thin films on the cavity mirrors of high-power lasers, and this has been investigated by Boccara and Fournier [1]. In this paper, the matrix transmission model of the photothermal effect in optical thin films with an arbitrary number of layers is established and applied to measure the absorbance of optical thin films with a single layer and multilayers. The sensitivity and the error in measurement are discussed, and the effectiveness of the application of the photothermal deflection technique to the weak absorbance measurement of optical thin films is proved.

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Reference

  1. A.C. Boccara, D. Fournier: Opt. Lett. 5, 377 (1980)

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  2. A.C. Boccara, D. Fournier, N.M. Amer, W.B. Jackson: Appl. Opt. 20, 1333 (1981)

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  3. Jin Shang-zhong: Laser and Infrared (in Chinese), No.6,7 (1985)

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© 1988 Springer-Verlag Berlin Heidelberg

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Shi, Bx., Hu, K., Chen, Wb. (1988). Weak Absorbance Measurement of Optical Thin Films Using the Laser Photothermal Deflection Technique. In: Hess, P., Pelzl, J. (eds) Photoacoustic and Photothermal Phenomena. Springer Series in Optical Sciences, vol 58. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-48181-2_52

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  • DOI: https://doi.org/10.1007/978-3-540-48181-2_52

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-662-13705-5

  • Online ISBN: 978-3-540-48181-2

  • eBook Packages: Springer Book Archive

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