Abstract
The composition of polishing slurry plays an important role in the material removal rate (MRR) and surface roughness of titanium alloy. In this study, chemical mechanical polishing (CMP) was used to polish TA31 titanium alloy, the MRR and surface roughness of the titanium alloy were used as evaluation indicators, and the abrasive concentration (A), H2O2 concentration (B), and pH (C) were used as the influencing factors to carry out the orthogonal experiment of titanium alloy free abrasive polishing. In this study, the composition of the polishing slurry was optimized, and the oxidation–reduction potential (ORP) of different polishing slurries was detected. Furthermore, the mechanism of the influence of the composition of different polishing slurries and ORP on the removal of polishing materials was discussed. The results of the study show that the best polishing rate is 43.991 nm/min, and the best surface roughness is 0.045 μm. The order of significant factors affecting the removal rate of titanium alloy is A (abrasive concentration) > B (H2O2 concentration) > C (pH), and the order of significant factors affecting the surface roughness of titanium alloy is C (pH) > A (abrasive concentration) > B (H2O2 concentration). The optimal slurry composition for material removal rate is abrasive concentration of 3%, H2O2 concentration of 5% and pH = 3, and the optimal slurry composition for surface roughness is abrasive concentration of 3%, H2O2 concentration of 5% and pH = 12. The research can lay an experimental foundation for further study on the mechanism of CMP of TA31 titanium alloy.
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References
D. Banerjee, J.C. Williams, Perspectives on titanium science and technology. Acta Mater. 61(3), 844–879 (2013)
I.V. Gorynin, Titanium alloys for marine application. Mater. Sci. Eng., A 263(2), 112–116 (1999)
B. Golaz, V. Michaud, S. Lavanchy et al., Design and durability of titanium adhesive joints for marine applications. Int. J. Adhes. Adhes. 45, 150–157 (2013)
Y.Q. Jiang, Y.C. Lin, X.Y. Zhang et al., Isothermal tensile deformation behaviors and fracture mechanism of Ti–5Al–5Mo–5V–1Cr–1Fe alloy in β phase field. Vacuum 156, 187–197 (2018)
B. Wang, P. Lei, G. Ma et al., Microstructure and properties of Ti80 alloy fabricated by hydrogen-assisted blended elemental powder metallurgy. Front. Mater. 7, 291 (2020)
N. Erbin, Lu. Li Man, C.L. Chang, Microstructure and mechanical properties of TA31 cast titanium alloy. Special Casting & Nonferrous Alloys. 39(10), 1135–1137 (2019)
Gao F, Yu W, Song D, et al. Fracture toughness of TA31 titanium alloy joints welded by electron beam welding under constrained condition. Mater. Sci. Eng. 772(Jan.20), 138612.1–138612.7 (2020)
Z. Suyin, D. Kai, X. Pifeng et al., Investigation on electropolishing of Ti film. High Power Laser & Particle Beams. 19(09), 1479–1482 (2007)
G.R. Dale, J.W.J. Hamilton, P.S.M. Dunlop et al., Electrochemical growth of titanium oxide nanotubes: the effect of surface roughness and applied potential. J. Nanosci. Nanotechnol. 9(7), 4215 (2009)
K. Lu, Z. Tian, J.A. Geldmeier, Polishing effect on anodic titania nanotube formation. Electrochim. Acta 56(17), 6014–6020 (2011)
M. Nakai, M. Niinomi, H. Tsutsumi, K. Saito, T. Goto, Calcium phosphate coating of biomedical titanium alloys using metal–organic chemical vapour deposition. Mater. Technol. 30(B1), B8–B12 (2015)
R.A. Difelice, J.G. Dillard, D. Yang, Chemical and nanomechanical properties of plasma-polymerized acetylene on titanium and silicon. Int. J. Adhes. Adhes. 25(4), 342–351 (2005)
Su. Jian-xiu, K. Ren-ke, G. Dong-ming, Technology analysis of wafer chemical mechanical polishing in the manufacture of ULSI. Semiconductor Technol. 10, 27–32 (2003)
D. Yuan-jing, P. Hui-fang, P. Guo-shun, L. Yan, Nanoscale planarization mechanism of titanium chemical mechanical polishing. Tribology 31(02), 131–136 (2011)
Z. Zhang, Z. Shi, Y. Du et al., A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry. Appl. Surf. Sci. 427, 409–415 (2018)
H. Tomoda, K. Kitajima, Development of polishing fluids for titanium alloy using lapping tape—effects of components in the polishing fluids on polishing characteristics. Int. J. Autom. Technol. 7(3), 300–305 (2013)
R.M. Kaushik, A.B. Bhandakkar, T.U. Patro, Solution of emulsifiable oil and hydrogen peroxide for chemical–mechanical polishing of Ti alloy—A green approach. Mater Lett. 122(may 1), 252–255 (2014)
A. Kadic, P. Chylenski, M. Hansen et al., Oxidation-reduction potential (ORP) as a tool for process monitoring of H2O2/LPMO assisted enzymatic hydrolysis of cellulose. Process Biochem. 86(Nov), 89–97 (2019)
F.A. Koch, W.K. Oldham, Oxidation-reduction potential – a tool for monitoring, control and optimization of biological nutrient removal systems. Wat. Sci. Tech. 17(11), 259–281 (1985)
W. Zhu, Mechanism of H2O2 decomposition catalysed by ethylenediaminetetraacetatoirqn ( III ) complex. Chin. J. Catal. 18(1), 83–86 (1997)
W. Yan-ling, Li. Li-jun, The preparation of electrode modified with silver /ethylenediamine and the catalysis with modified electrode to hydrogen peroxide. J. Huaibei Normal Univ. (Natural Sci.) 32(01), 47–49 (2011)
S.Y. Chiu, Y.L. Wang, C.P. Liu et al., The application of elecrochemical metrologies for investigating chemical mechanical polishing of Al with a Ti barrier layer. Mater. Chem. Psysl. 82(2), 444–445 (2003)
C. Liang, W. Liu, S. Li, H. Kong, Z. Zhang, Z. Song, A nano-scale mirror-like surface of Ti–6Al–4V attained by chemical mechanical polishing. Chin. Phys. B. 25(05), 445–451 (2016)
X. Lei, X. Wang, Corrosion behavior of titanium in hydrogen peroxide solutions. Rare Metal Mater. Eng. 35(8), 1219–1222 (2006)
X. Fu, H. Yang, H. Sun, G. Lu, J. Wu, The multiple roles of ethylenediamine modification at TiO2/activated carbon in determining adsorption and visible-light-driven photoreduction of aqueous Cr(VI). J. Alloys Compounds 662, 165–172 (2016)
H. Li, Y. Hao, H. Lu et al., A systematic study on visible-light N-doped TiO2 photocatalyst obtained from ethylenediamine by sol–gel method. Appl. Surface Sci. 344(jul 30), 112–118 (2015)
Funding
This study was funded by the National Natural Science Foundation of China (U1804142), China Postdoctoral Science Foundation (2020M672220), Science and Technology Plan Projects of Henan Province (212102210062), Postdoctoral Research Project of Henan Province (201903045), the Program for Innovative Research Team (in Science and Technology) in University of Henan Province (Grant no. 20IRTSTHN016).
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Wang, Z., Zhang, Z., Wang, S. et al. Composition Optimization of Slurry for Polishing TA31 Titanium Alloy with Free Abrasive. J. Inst. Eng. India Ser. E 102, 377–386 (2021). https://doi.org/10.1007/s40034-021-00230-4
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DOI: https://doi.org/10.1007/s40034-021-00230-4