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Overview of Plasma Diagnostic Techniques

  • Chapter
Handbook of Advanced Plasma Processing Techniques

Abstract

Plasma diagnostics is a broad area of technology that encompasses a diverse, venerable field of experimental techniques designed to provide information about the characteristics of a plasma. Plasmas used in microelectronics processing fall into the broad category of low temperature plasmas. Typical plasma characteristics include electron densities between 109 and 1012 cm-3, electron temperatures from 0.1 to 10 eV, pressures of a few Torr to millitorr or below and excitation frequencies from dc to microwave. These parameters span a relatively wide range of conditions and make the selection of the best diagnostic tools challenging.

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  1. Sandia National Laboratories, P.O. Box 5800, Albuquerque, NM, 87185, USA

    G. A. Hebner, P. A. Miller & J. R. Woodworth

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  1. G. A. Hebner
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  1. Sandia National Laboratories, Dept. 1313, MS 0603, PO Box 5800, NM, 87185, Albuquerque, USA

    Randy J. Shul

  2. Dept. Mat. Sci. Eng., University of Florida, 132 Rhines Hall, PO Box 116400, FL, 32611, Gainesville, USA

    Stephen J. Pearton

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Hebner, G.A., Miller, P.A., Woodworth, J.R. (2000). Overview of Plasma Diagnostic Techniques. In: Shul, R.J., Pearton, S.J. (eds) Handbook of Advanced Plasma Processing Techniques. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-56989-0_5

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