Abstract
Experimental realization of the hysteresis-free mode of vanadium reactive magnetron sputtering in Ar-O2 mixtures made it possible to perform detailed measurements of the discharge current-voltage characteristics for the first time. They appeared to be not smooth, as predicted by the existing model of reactive sputtering, but having a kink. The experimental data can be interpreted on the assumption that the target surface is oxidized at a depth not less than two monolayers at low ion current densities.
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Original Russian Text © V.A. Marchenko, 2009, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2009, Vol. 73, No. 7, pp. 920–923.
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Marchenko, V.A. Processes on the target surface under vanadium reactive sputtering in Ar-O2 mixtures. Bull. Russ. Acad. Sci. Phys. 73, 867–870 (2009). https://doi.org/10.3103/S1062873809070016
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DOI: https://doi.org/10.3103/S1062873809070016