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Microcrystalline Cubic Boron Nitride/Amorphous Hydrogenated Boron Nitride Mixed Phase Thin Films

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Abstract

Transparent and insulating thin films have been grown by the plasma decomposition of B2H6, NH3, and H2, at a substrate temperature of 250°C. From chemical composition, transmission electron microscopy, infrared absorption, and optical absorption measurements, the thin films are determined to be a mixed phase of crystalline cubic boron nitride and amorphous hydrogenated boron nitride. Also, the films have significantly more boron than nitrogen, a large concentration of hydrogen, a very large bandgap, strong infrared aborption due to both hexagonal boron nitride and boron icosahedra, and good adhesion to various substrates.

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Authors and Affiliations

  1. Department of Physics and the Center for Molecular Electronics, University of Missouri, St. Louis, MO, 63121, USA

    Shu-Han Lin & Bernard J. Feldman

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  1. Shu-Han Lin
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  2. Bernard J. Feldman
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Lin, SH., Feldman, B.J. Microcrystalline Cubic Boron Nitride/Amorphous Hydrogenated Boron Nitride Mixed Phase Thin Films. MRS Online Proceedings Library 358, 817 (1994). https://doi.org/10.1557/PROC-358-817

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  • DOI: https://doi.org/10.1557/PROC-358-817

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