Nanocrystals in crystalline silicon: Void formation and hollow particles

Abstract

Nanophase precipitates of CdS formed in amorphous SiO₂ by ion implantation and thermal processing have recently been found to exhibit a “hollow-particle” or “shell-like” microstructure. The present investigations show that this hollow-particle microstructure can be reproduced for a variety of materials other than CdS, and these results provide new insight into the mechanisms responsible for the formation of hollow precipitates embedded in solid hosts. Various elemental metal nanocrystals were formed in (100)-oriented crystalline Si hosts by ion implantation coupled with thermal treatments in which the annealing parameters were varied to investigate the “hollow-particle” formation conditions. The results indicate that depending on the melting points and vapor pressure of the precipitates or on the initial state of the host material, several processes acting either independently or in concert can lead to hollow precipitate formation. First, the implantation of materials having a high vapor pressure, either at the implant temperature or when heated during annealing, can lead to the formation of cavities in the crystalline host. Hollow precipitates can then form by a partial filling and coating of the cavity walls by the implanted species in a diffusion-based gettering/ripening process. Internal void formation can also occur or be enhanced by volume contraction during cooling if the particle solidifies from a liquid phase.