Abstract
The structure of alumina (Al2O3) films of various thicknesses grown by the atomic layer deposition method on porous silica (por-SiO2) substrates has been studied using soft X-ray reflection spectroscopy. It is established that the synthesized films are amorphous and that the ratio of Al atoms with tetrahedral and octahedral coordinations in a film depends on its thickness. It can be suggested that thicker Al2O3 films contain a greater proportion of Al atoms with tetrahedral coordination.
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Original Russian Text © A S. Konashuk, A.A. Sokolov, V.E. Drozd, A.A. Romanov, E.O. Filatova, 2012, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2012, Vol. 38, No. 12, pp. 24–29.
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Konashuk, A.S., Sokolov, A.A., Drozd, V.E. et al. The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy. Tech. Phys. Lett. 38, 562–564 (2012). https://doi.org/10.1134/S1063785012060235
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DOI: https://doi.org/10.1134/S1063785012060235