Abstract
The interaction of magnetron-sputtered metal iron with titanium-oxide films upon isothermal vacuum annealing is studied by X-ray phase analysis, secondary-ion mass spectrometry, atomic-force microscopy, and mathematical simulation. A mechanism for the formation of complex oxides at grain boundaries is suggested. The mechanism is based on the reaction diffusion of metal iron into titanium oxide. A quantitative model of reaction interdiffusion in two-layer polycrystalline metal–oxide film systems with limited component solubility is developed. From numerical analysis of the experimental distributions of the metal concentrations in the Fe–TiO2 film system, the individual diffusion coefficients are determined. It is found that, under the conditions of vacuum annealing at 1073 K, the diffusion coefficients of iron and titanium are 8.0 × 10–13 and 3.0 × 10–15 cm2 s–1, respectively.
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Original Russian Text © N.N. Afonin, V.A. Logacheva, 2017, published in Fizika i Tekhnika Poluprovodnikov, 2017, Vol. 51, No. 10, pp. 1351–1356.
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Afonin, N.N., Logacheva, V.A. Interdiffusion and phase formation in the Fe–TiO2 thin-film system. Semiconductors 51, 1300–1305 (2017). https://doi.org/10.1134/S1063782617100025
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DOI: https://doi.org/10.1134/S1063782617100025