Abstract
The reason why manganese monosilicide inclusions are formed during the growth of higher manganese silicide (HMS) crystals has not been studied in detail so far. Changes in the amount and density of these inclusions are greatly influenced by dopants. In this study, the structure of HMS crystals with various contents of germanium as a doping element is examined. It is found that raising the germanium content to 1 at % results in the fragmentation of layered manganese monosilicide inclusions and, simultaneously, leads to significant changes in the thermoelectric properties of HMS crystals. The results of the microstructural analysis of HMS crystals in relation to the germanium concentration may be of use for understanding the mechanism by which the manganese monosilicide phase is formed during the growth of higher manganese silicide crystals.
Similar content being viewed by others
References
U. Gottlieb, A. Sulpice, B. Lambert-Andron, and O. Laborde, J. Alloys Compd. 361, 13 (2003).
O. Schwomma, A. Preisinger, H. Nowotny, and A. Wittmann, Monatsh. Chem. 95, 1527 (1964).
O. Schwomma, H. Nowotny, and A. Wittmann, Monatsh. Chem. 94, 681 (1963).
L. M. Levinson, J. Solid State Chem. 6, 126 (1973).
A. S. Orekhov and E. I. Suvorova, Crystallogr. Rep. 59, 78 (2014).
A. S. Orekhov, T. S. Kamilov, A. S. Orekhov, N. A. Arkharova, E. V. Rakova, and V. V. Klechkovskaya, Nanotechnol. Russ. 11, 610 (2016).
Z. M. Wang, Y. D. Wu, and Y. J. He, Int. J. Mod. Phys. B 18, 87 (2004).
I. Aoyama, M. I. Fedorov, V. K. Zaitsev, F. Yu. Solomkin, I. S. Eremin, A. Yu. Samunin, M. Mukoujima, S. Sano, and T. Tsuji, Jpn. J. Appl. Phys. 44, 8562 (2005).
J. Goldstein, D. E. Newbury, D. C. Joy, C. E. Lyman, P. Echlin, E. Lifshin, L. Sawyer, and J. R. Michael, Scanning Electron Microscopy and X-Ray Microanalysis (Springer Science, New York, 2003), p. 690.
A. T. Burkov, A. Heinrich, P. P. Konstantinov, T. Nakama, and K. Yagasaki, Meas. Sci. Technol. 12, 264 (2001).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © A.S. Orekhov, V.V. Klechkovskaya, E.V. Rakova, F.Yu. Solomkin, S.V. Novikov, L.V. Bochkov, G.N. Isachenko, 2017, published in Fizika i Tekhnika Poluprovodnikov, 2017, Vol. 51, No. 7, pp. 925–928.
Rights and permissions
About this article
Cite this article
Orekhov, A.S., Klechkovskaya, V.V., Rakova, E.V. et al. The dependence of the microstructure and thermoelectric properties of germanium-doped higher manganese silicide crystals. Semiconductors 51, 887–890 (2017). https://doi.org/10.1134/S1063782617070302
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063782617070302