Abstract
It is shown that the atomic layer deposition of thin AlN layers can be used to passivate the surface states of GaAs nanowires synthesized by molecular-beam epitaxy. Studies of the optical properties of samples by low-temperature photoluminescence measurements shows that the photoluminescence-signal intensity can be increased by a factor of up to five by passivating the nanowires with a 25-Å-thick AlN layer.
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Original Russian Text © I.V. Shtrom, A.D. Bouravleuv, Yu.B. Samsonenko, A.I. Khrebtov, I.P. Soshnikov, R.R. Reznik, G.E. Cirlin, V. Dhaka, A. Perros, H. Lipsanen, 2016, published in Fizika i Tekhnika Poluprovodnikov, 2016, Vol. 50, No. 12, pp. 1644–1646.
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Shtrom, I.V., Bouravleuv, A.D., Samsonenko, Y.B. et al. Surface passivation of GaAs nanowires by the atomic layer deposition of AlN. Semiconductors 50, 1619–1621 (2016). https://doi.org/10.1134/S1063782616120186
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DOI: https://doi.org/10.1134/S1063782616120186