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Influence of gate-to-source and gate-to-drain recesses on GaAs camel-like gate field-effect transistors

  • Physics of Semiconductor Devices
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Abstract

In this article, the characteristics of the GaAs homojunction camel-like gate field-effect transistors with and without the gate-to-source and gate-to-drain recesses structures are first investigated and compared. As to the device without the recesses structure, a second channel within the n +-GaAs cap layer is formed at large gate bias, which could enhance the drain output current and transconductance. Furthermore, a two-stage relationship between drain current (and transconductance) versus gate voltage is observed in the recesses structure. The simulated results exhibit a maximum drain saturation current of 447 (351 mA/mm) and a maximum transconductance of 525 (148 mS/mm) in the studied device without (with) the recesses structure. Consequentially, the demonstration and comparison of the variable structures provide a promise for design in circuit applications.

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References

  1. H. Kamitsuna, Y. Yamane, M. Tokumitsu, H. Sugahara, and M. Muraguchi, IEEE J. Solid State Circuits 41, 452 (2006).

    Article  Google Scholar 

  2. Y. S. Lin, Y. C. Ma, and Y. T. Lin, J. Electrochem. Soc. 158, H305 (2011).

    Article  Google Scholar 

  3. H. Y. Liu, B. Y. Chou, W. C. Hsu, C. S. Lee, and C. S. Ho, IEEE Trans. Electron Dev. 58, 4430 (2011).

    Article  ADS  Google Scholar 

  4. A. Bensoussan, R. Marec, J. L. Muraro, L. Portal, P. Calvel, C. Barillot, M. G. Perichaud, L. Marchand, and G. Vignon, Microelectron. Reliab. 53, 1466 (2013).

    Article  Google Scholar 

  5. K. H. Yu, K. W. Lin, C. C. Cheng, K. P. Lin, C. H. Yen, C. Z. Wu, and W. C. Liu, Electron. Lett. 36, 1886 (2000).

    Article  Google Scholar 

  6. J. H. Tsai, K. P. Zhu, Y. C. Chu, and S. Y. Chiu, Electron. Lett. 39, 1611 (2003).

    Article  Google Scholar 

  7. J. H. Tsai, IEEE Electron. Lett. 26, 429 (2005).

    Article  ADS  Google Scholar 

  8. SILVACO 2013 Atals User’s Manual Editor I (SILVACO Int. Santa Clara, CA, USA).

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Correspondence to Jung-Hui Tsai.

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Tsai, JH., Wu, YR., Chiang, CC. et al. Influence of gate-to-source and gate-to-drain recesses on GaAs camel-like gate field-effect transistors. Semiconductors 48, 1222–1225 (2014). https://doi.org/10.1134/S106378261409022X

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  • DOI: https://doi.org/10.1134/S106378261409022X

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