Abstract
Internal reflection features caused by the surface plasmon resonance in nanoscale films containing defect tin dioxide clusters in the stoichiometric dielectric matrix are studied by the method of polarization modulation of electromagnetic radiation. The angular and spectral characteristics of reflectances R 2 s and R 2 p of s- and p-polarized radiation and their polarization difference ρ = R 2 s − R 2 p are measured in the wavelength range λ = 400–1600 nm. The experimental characteristics ρ(ϑ, λ) (ϑ is the radiation incidence angle) obtained represent the optical property features associated with the film structure and morphology. Surface plasmon polaritons and local plasmons excited by s- and p-polarized radiation are detected; their frequency and relaxation properties are determined. The structural sensitivity of the technique for studying the surface plasmon resonance for tin dioxide films is shown.
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Original Russian Text © V.S. Grinevich, L.S. Maximenko, I.E. Matyash, O.N. Mischuk, S.P. Rudenko, B.K. Serdega, V.A. Smyntyna, L.N. Filevskaya, 2011, published in Fizika i Tekhnika Poluprovodnikov, 2011, Vol. 45, No. 11, pp. 1525–1532.
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Grinevich, V.S., Maximenko, L.S., Matyash, I.E. et al. Polarization characteristics of surface plasmon resonance in SnO2 nanocluster films. Semiconductors 45, 1467–1473 (2011). https://doi.org/10.1134/S1063782611110108
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DOI: https://doi.org/10.1134/S1063782611110108