Abstract
Multi-point cathode matrices, the surface density of which is 107–109 cm–2 and the maximum field-emission current density is 1.5–2 orders of magnitude higher than that obtained on silicon crystals with the help of traditional microelectronic technologies, are fabricated using the self-organization phenomenon during the microwave plasma deposition of submonolayer carbon mask films onto silicon (100) crystals with a natural oxide coating and highly anisotropic plasma-chemical etching. The mechanism whereby mask carbon coatings are formed is discussed, and the optimal duration of the formation processes is determined. The interdependence between the surface morphology and field-emission properties is described in the scope of the Fowler‒Nordheim theory taking into account microstructural changes in the surface phases of silicon asperities.
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Original Russian Text © R.K. Yafarov, A.V. Smirnov, A.R. Yafarov, 2018, published in Poverkhnost’, 2018, No. 10, pp. 80–85.
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Yafarov, R.K., Smirnov, A.V. & Yafarov, A.R. Influence of a Carbon-Modified Surface on the Field-Emission Properties of Silicon Crystals. J. Surf. Investig. 12, 1013–1017 (2018). https://doi.org/10.1134/S1027451018050361
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DOI: https://doi.org/10.1134/S1027451018050361