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Oriented In3–x S4 films on the (100) surface of Si, GaAs, and InP single crystals

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Abstract

Spray pyrolysis of aqueous solutions, with thiourea as a sulfurizing agent, has been used to grow cubic indium sulfide films on single-crystal substrates: In3–x S4(111)/Si(100), In3–x S4(111)/GaAs(100), and In3–x S4(111)/InP(100). The lattice parameter a of the sulfide has been shown to increase with an increase in the lattice parameter of the substrate, whereas the film grown on GaAs has the highest lattice strain (as assessed from X-ray diffraction line broadening). The films have a constant phase composition and (111) texture, in contrast to films grown on glassy substrates by the same method.

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Correspondence to A. V. Naumov.

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Original Russian Text © A.V. Naumov, A.V. Sergeeva, V.N. Semenov, 2017, published in Neorganicheskie Materialy, 2017, Vol. 53, No. 6, pp. 570–577.

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Naumov, A.V., Sergeeva, A.V. & Semenov, V.N. Oriented In3–x S4 films on the (100) surface of Si, GaAs, and InP single crystals. Inorg Mater 53, 560–567 (2017). https://doi.org/10.1134/S0020168517060127

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  • DOI: https://doi.org/10.1134/S0020168517060127

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