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Effect of thermal evaporation rate on the basic physical properties of glassy (As2S3) x (As2Se3)1−x films

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Abstract

We have studied the effect of thermal evaporation rate on the basic physical properties of glassy (As2S3) x (As2Se3)1−x thin films on glass substrates and have determined the optimal range of deposition rates corresponding to the highest photosensitivity and long-term stability of the films. The results are interpreted in terms of the interaction between the deposit and the residual gas in the vacuum chamber.

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Authors and Affiliations

  1. Transnistria State University, ul. 25 Oktyabrya 128, Tiraspol, MD-3300, Moldova

    T. I. Goglidze, V. M. Ishimov & E. A. Senokosov

  2. Moldova State University, ul. Mateevicha 60, Chisinau, MD-2009, Moldova

    I. V. Dement’ev

Authors
  1. T. I. Goglidze
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  2. I. V. Dement’ev
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  3. V. M. Ishimov
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  4. E. A. Senokosov
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Original Russian Text © T.I. Goglidze, I.V. Dement’ev, V.M. Ishimov, E.A. Senokosov, 2007, published in Neorganicheskie Materialy, 2007, Vol. 43, No. 1, pp. 97–101.

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Goglidze, T.I., Dement’ev, I.V., Ishimov, V.M. et al. Effect of thermal evaporation rate on the basic physical properties of glassy (As2S3) x (As2Se3)1−x films. Inorg Mater 43, 90–93 (2007). https://doi.org/10.1134/S0020168507010189

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  • DOI: https://doi.org/10.1134/S0020168507010189

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