Abstract
TiO2 films were prepared via a two-step fabrication process, i.e. deposition of Ti films by magnetron sputtering on an FTO glass substrate followed by thermal oxidation at 600–725 °C. The investigated parameters were Ti layer thickness, temperature of oxidation and deposition conditions (pre-treatment and substrate heating). Such TiO2 films have a rutile structure and contain metallic Sn which is the result of a thermal reaction at the interface between SnO2 and Ti at temperatures above 500 °C. A calcination temperature of 600 °C is optimal for fabricating TiO2 films with significant photoelectrochemical response. Heating of the FTO substrate during magnetron sputtering deposition of Ti films results in a significant improvement of the compactness of the TiO2 films. A similar but not so pronounced improvement was observed for the TiO2 films deposited on the FTO substrate pre-treated with radio-frequency plasma under Ar–O2 and N2–H2 atmosphere. The observed correlation between the increased content of Sn in the TiO2 films and compactness of the TiO2 films supports the explanation of both positive effects by better adhesion of the Ti films to the FTO substrate.
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References
I. Mintsouli, N. Philippidis, I. Poulios and S. Sotiropoulos, Photoelectrochemical characterisation of thermal and particulate titanium dioxide electrodes, J. Appl. Electrochem., 2006, 36, 463.
O. R. Camara, C. P. De Pauli, M. E. Vaschetto, B. Retamal, M. J. Aquirre, J. H. Zagal and S. R. Biaggio, Semiconducting properties of TiO2 films thermally formed at 400° C, J. Appl. Electrochem., 1995, 25, 247.
R. Palombari, M. Ranchella, C. Rol and G. V. Sebastiani, Oxidative photoelectrochemical technology with Ti/TiO2 anodes, Sol. Energy Mater. Sol. Cells, 2002, 71, 359.
J. Krysa, M. Zlámal and G. Waldner, Effect of oxidisable substrates on the photoelectrocatalytic properties of thermally grown and particulate TiO2 layers, J. Appl. Electrochem., 2007, 37, 1313.
L. Kavan, N. Tétreault, T. Moehl and M. Grätzel, Electrochemical Characterization of TiO2 Blocking Layers for Dye-Sensitized Solar Cells, J. Phys. Chem. C, 2014, 118, 16408.
J. Krysa, K. Lee, S. Pausova, S. Kment, Z. Hubicka, R. Ctvrtlik and P. Schmuki, Self-organized transparent 1D TiO2 nanotubular photoelectrodes grown by anodization of sputtered and evaporated Ti layers: A comparative photo-electrochemical study, Chem. Eng. J., 2017, 308, 745.
ICDD, Powder Diffraction File, ed. S. Kabekkodu, International Centre for Diffraction Data, 12 Campus Boulevard, Newton Square, Pennsylvania, 2017, pp. 19073–13272.
H. J. T. Ellingham, Reducibility of oxides and sulphides in metallurgical processes, J. Soc. Chem. Ind., London., 1944, 63, 124.
F. D. Richardson and J. H. E. Jeffes, The Thermodynamics of Substances of Interest in Iron and Steel Making from 0 °C to 2400 °C: I. Oxides, J. Iron Steel Inst., London, 1948, 160, 261.
M. S. Moreno, G. Punte, G. Rigotti, R. C. Mercader, A. D. Weisz and M. A. Blessa, Kinetic study of the disproportionation of tin monoxide, Solid State Ionics, 2001, 144, 81.
M. S. Moreno, R. C. Mercader and A. G. Bibiloni, Study of intermediate oxides in SnO thermal decomposition, J. Phys.: Condens. Matter, 1992, 4, 351.
H. Giefers, F. Porsch and G. Wortmann, Kinetics of the disproportionation of SnO, Solid State Ionics, 2005, 176, 199.
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Electronic supplementary information (ESI) available. See DOI: 10.1039/c8pp00313k
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Krýsa, J., Krýsová, H., Hubička, Z. et al. Transparent rutile TiO2 films prepared by thermal oxidation of sputtered Ti on FTO glass. Photochem Photobiol Sci 18, 891–896 (2019). https://doi.org/10.1039/c8pp00313k
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DOI: https://doi.org/10.1039/c8pp00313k