Abstract
Two- and three-layer functionally graded PVD targets with a “working” layer (sputtering surface) based on TiN-TiB2 or TiN-Ti5Si3 formation via the technology of forced SHS compaction were considered. It was shown that rather wide (up to 1 mm) transition diffusional zones providing firm adhesion of the layers were formed between the working, intermediate, and third layers. The compositions TiN + TiB2 + 20%Cu and TiB2 + 50%Cu were found to be optimum for the intermediate (“damping”) and third layers of the three-layer PVD targets. The specific features of phase and structure formation of the two- and three-layer products with the working layer based on TiN-TiB2 and TiN-Ti5Si3 were elucidated. Variation of the “chemical oven” mass exerted a noticeable effect of reduction of the residual porosity and enlarging of the grains of the product phases owing to prolongation of the time for secondary structure formation. The relationship of the hardness of the layers in the functionally graded target on the chemical oven mass allow prediction of the properties of the resultant graded material systems.
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Levashov, E.A., Larikhin, D.V., Shtansky, D.V. et al. Self-Propagating High-Temperature Synthesis of Functionally Graded PVD Targets with a Ceramic Working Layer of TiB2-TiN or Ti5Si3-TiN. Journal of Materials Synthesis and Processing 10, 319–330 (2002). https://doi.org/10.1023/A:1023881718671
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DOI: https://doi.org/10.1023/A:1023881718671